基本信息
This semiconductor wafer dedicated vacuum cleaning machine is designed for high-end electronic industries such as chip manufacturing and semiconductor packaging. It meets the ISO 5 class clean room standards, using high-precision vacuum and ultrasonic technology to particles, photoresist residue and metal ions on the surface of wafers, ensuring the yield of semiconductor devices. It is equipped with an automatic chemical dosing system, which automatically completes the cleaning process according to the RCA standard cleaning process, suitable for large-scale semiconductor production workshops to ensure the cleanliness requirements of the production process.
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